Corporate / Intellectual Property
Intellectual Property
Instruments
Transport of DPN Patterning Compounds
This family describes a number of inventions that are important to delivering patterning compounds to tips for DPN patterning. These regimes, including microfluidic designs and "inkwells," allow significant increases in speed and reliability of the patterning process.
| US 7,034,854 | Methods and Apparatus for Ink Delivery to Nanolithographic Probe Systems | Granted, April 2006 |
| WO 2004/044552 A2 | Methods and Apparatus for Ink Delivery to Nanolithographic Probe Systems | Published, May 2004 |
Prototyping Substrates
This family describes a new nanolithography tool including the design, method of fabrication, and compatibility with DPN nanolithography. The tool comprises a surface suitable for designing tests of nanoscale materials (most notably electronic) and components for connecting that surface to external, conventional test equipment.
| US 2004/0026681 | Protosubstrates | Published, February 2004 |
| WO 2005/084092A2 | Protosubstrates | Published, April 2004 |
| WO 2005/084092A2 | Protosubstrates | Published, February 2004 |
University of Illinois Filings
This family, licensed exclusively from the University of Illinois, concerns methods of manufacture of and use of arrays of actuated probes for performing Dip Pen Nanolithography in a faster, more flexible manner.
| US 6,642,129 | Parallel, Individually Addressable Probes for Nanolithography | Granted, November 2003 |
| US 6,86,7443 | Parallel, Individually Addressable Probes for Nanolithography | Granted, March 2005 |
| WO 03/036767 A3 | Parallel, Individually Addressable Probes for Nanolithography | Published, May 2003 |
| CA 2454963 AA | Parallel, Individually Addressable Probes for Nanolithography | Published, May 2003 |
| CN 1554119 A | Parallel, Individually Addressable Probes for Nanolithography | Published, December 2004 |
| EP 1410436 | Parallel, Individually Addressable Probes for Nanolithography | Published, April 2004 |
| JP 2005-507175 T2 | Parallel, Individually Addressable Probes for Nanolithography | Published, March 2005 |
Other Licensing Agreements
NanoInk licensed nine domestic and five foreign patents from Stanford University in 2002. These patents relate to the manufacture of tips for scanning probe/atomic force microscopes, and licensing them is fundamental to NanoInk's strategy of building and selling complex Pen systems to scale the DPN process.
| US 5,221,415 | Method of forming microfabricated cantilever stylus with integrated pyramidal tip | Granted, June 1993 |
| US 5,399,232 | Microfabricated cantilever stylus with integrated pyramidal tip | Granted, March 1995 |
| US 5,580,827 | Casting sharpened microminiature tips | Granted, December 1996 |
| US 5,345,815 | Atomic force microscope having cantilever with piezoresistive deflection sensor | Granted, September 1994 |
| US 5,483,822 | Cantilever and method of using same to detect features on a surface | Granted, January 1996 |
| US 5,595,942 | Method of fabricating cantilever for atomic force microscope having piezoresistive deflection detector | Granted, January 1997 |
| US 5,742,377 | Cantilever for scanning probe microscope including piezoelectric element and method of using the same | Granted, April, 1998 |
| US 5,883,705 | Atomic force microscope for high speed imaging including integral actuator and sensor | Granted, March 1999 |
| US 6,075,585 | Vibrating probe for a scanning probe microscope | Granted, June 2003 |
| KR 214152 | Piezoresistive Cantilever For Atomic Force Microscope | Granted, August 1999 |
| HK 1007794 | Piezoresistive cantilever for atomic force microscopy | Granted, April 1999 |
| EPO 619872 | Piezoresistive cantilever for atomic force microscopy | Granted, February 1997 |
| CH 619872 | Piezoresistive cantilever for atomic force microscopy | Granted, February 1997 |
| DE 69125956 | Piezoresistive cantilever for atomic force microscopy | Granted June 1997 |
Other Licensing Agreements
NanoInk licensed two patents from the Georgia Institute of Technology. The patents describe an apparatus for nanolithography and a process for thermally controlling the deposition of a solid "organic ink." This invention allows for greater spatial resolution than those used in other nanolithography methods.
| US 2006/0040057A1 | Thermal Control Of Deposition In Dip Pen Nanolithography | Published, February 2006 |
| WO 2006/036217 A2 | Thermal Control Of Deposition In Dip Pen Nanolithography | Published, April 2006 |
Other families of patent portfolio:
