Corporate / Intellectual Property
Intellectual Property
Repair
DPN Patterning for Photomask Repair
This family describes broad DPN technology that can be used to repair nanoscale defects in materials, most notably to correct defects in photomasks and other semiconductor/IC devices and materials.
| US 2004/0175631 A1 | Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication | Published, September 2004 |
| WO 2004/038504 A2 | Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication | Published, May 2004 |
| JP 2005-539400 | Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication | Published, July 2005 |
| EP 1509816 A2 | Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication | Published, January 2006 |
Flat Panel Display Repair
This family concerns methods for patterning micron-scale conductive material and its applications for the repair of flat panel displays.
| US 2005/0235869 A1 | Micrometric Direct-Write Methods for Patterning Conductive Material and Applications to Flat Panel Display Repair | Published, October 2005 |
| WO 2005/084092A2 | Micrometric Direct-Write Methods for Patterning Conductive Material and Applications to Flat Panel Display Repair | Published, September 2005 |
Other families of patent portfolio:
